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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Cain, Jason P., Sanchez, Martha I., Kim, Young-Sik, Hwang, Young-Sun, Jung, Mi-Rim, Yoo, Ji-Hwan, Kwon, Won-Taik, Ryan, Kevin, Tuffy, Paul, Zhang, Youping, Park, Sean, Oh, Nang-Lyeom, Park, Chris, Sha

Année:

2015

Langue:

english

Fichier:

PDF, 1.10 MB

english, 2015

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Cain, Jason P., Sanchez, Martha I., Takamasu, Kiyoshi, Okitou, Haruki, Takahashi, Satoru, Inoue, Osamu, Kawada, Hiroki, Kamineni, Vimal, Paul, Abhijeet, Bello, A. F.

Année:

2014

Langue:

english

Fichier:

PDF, 311 KB

english, 2014

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Investigating SEM metrology effects using a detailed SEM simulation and stochastic resist model

Cain, Jason P., Sanchez, Martha I., Lawson, Richard A., Henderson, Clifford L.

Année:

2015

Langue:

english

Fichier:

PDF, 2.36 MB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography

Cain, Jason P., Sanchez, Martha I., Okai, Nobuhiro, Lavigne, Erin, Hitomi, Keiichiro, Halle, Scott, Hotta, Shoji, Koshihara, Shunsuke, Petrillo, Karen, Yamaguchi, Atsuko, Tanaka, Junichi, Bailey, Todd

Année:

2014

Langue:

english

Fichier:

PDF, 1.87 MB

english, 2014

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Metrology of advanced N14 process pattern split at lithography

Cain, Jason P., Sanchez, Martha I., Tzai, Wei-Jhe, Lin, Chia-Ching, Chen, Chien-Hao, Yu, Chun Chi, Chu, Wei-Yuan, Yoo, Sungchul, Huang, Chien-Jen, Cheng, Chao-Yu, Su, Hsiao-Fei

Année:

2014

Langue:

english

Fichier:

PDF, 600 KB

english, 2014

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - An integrated design-to-manufacturing flow for SADP

Capodieci, Luigi, Cain, Jason P., Hamed Fatehy, Ahmed, Kotb, Rehab, Word, James

Année:

2016

Langue:

english

Fichier:

PDF, 1.82 MB

english, 2016

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Cost effective solution using inverse lithography OPC for DRAM random contact layer

Capodieci, Luigi, Cain, Jason P., Jun, Jinhyuck, Hwang, Jaehee, Choi, Jaeseung, Oh, Seyoung, Park, Chanha, Yang, Hyunjo, Dam, Thuc, Do, Munhoe, Lee, Dong Chan, Xiao, Guangming, Choi, Jung-Hoe, Lucas,

Année:

2017

Langue:

english

Fichier:

PDF, 1.25 MB

english, 2017

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Comparative defect classifications and analysis of Lasertec's M1350 and M7360

Cain, Jason P., Sanchez, Martha I., Godwin, Milton, Balachandran, Dave, Tamura, Tomoya, Jia, Anwei

Année:

2014

Langue:

english

Fichier:

PDF, 3.34 MB

english, 2014

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Gaps analysis for CD metrology beyond the 22nm node

Bunday, Benjamin, Germer, Thomas A., Vartanian, Victor, Cordes, Aaron, Cepler, Aron, Settens, Charles, Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 2.88 MB

english, 2013

10

Help Wanted: Realigning Journalism Education to Meet the Needs of Top U.S. News Companies

Wenger, Deb Halpern, Owens, Lynn C., Cain, Jason

Journal:

Journalism & Mass Communication Educator

Année:

2018

Langue:

english

Fichier:

PDF, 94 KB

english, 2018

11

Actual vs. Perceived Motor Competence in Children (8–10 Years): An Issue of Non-Veridicality

Clark, Cain, Moran, Jason, Drury, Benjamin, Venetsanou, Fotini, Fernandes, John

Journal:

Journal of Functional Morphology and Kinesiology

Année:

2018

Langue:

english

Fichier:

PDF, 523 KB

english, 2018

12

How Drugs are Developed and Approved by the FDA: Current Process and Future Directions

Ciociola, Arthur A, Cohen, Lawrence B, Kulkarni, Prasad, Kefalas, Costas, Buchman, Alan, Burke, Carol, Cain, Tedd, Connor, Jason, Ehrenpreis, Eli D, Fang, John, Fass, Ronnie, Karlstadt, Robyn, Pambian

Journal:

American Journal of Gastroenterology

Année:

2014

Langue:

english

Fichier:

PDF, 168 KB

english, 2014

13

What Is News? Audiences May Have Their Own Ideas

Armstrong, Cory L., McAdams, Melinda J., Cain, Jason

Journal:

Atlantic Journal of Communication

Année:

2015

Langue:

english

Fichier:

PDF, 184 KB

english, 2015

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes

Cain, Jason P., Sanchez, Martha I., Rana, Narender, Zhang, Yunlin, Kagalwala, Taher, Hu, Lin, Bailey, Todd

Année:

2014

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2014

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Hybrid hotspot detection using regression model and lithography simulation

Capodieci, Luigi, Cain, Jason P., Kimura, Taiki, Matsunawa, Tetsuaki, Nojima, Shigeki, Pan, David Z.

Année:

2016

Langue:

english

Fichier:

PDF, 994 KB

english, 2016

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Integrated production overlay field-by-field control for leading edge technology nodes

Cain, Jason P., Sanchez, Martha I., Chung, Woong Jae, Tristan, John, Gutjahr, Karsten, Subramany, Lokesh, Li, Chen, Sun, Yulei, Yelverton, Mark, Kim, Young Ki, Kim, Jeong Soo, Huang, Chin-Chou Kevin,

Année:

2014

Langue:

english

Fichier:

PDF, 2.88 MB

english, 2014

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node

Cain, Jason P., Sanchez, Martha I., Jeon, Bumhwan, Lee, Sam, Subramany, Lokesh, Li, Chen, Pal, Shyam, Meyers, Sheldon, Mehta, Sohan, Wei, Yayi, Cho, David R.

Année:

2014

Langue:

english

Fichier:

PDF, 252 KB

english, 2014

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)

Cain, Jason P., Sanchez, Martha I., Hsu, Simon C. C., Chen, Charlie, Yu, Chun Chi, Pai, Yuan Chi, Amit, Eran, Yap, Lipkong, Itzkovich, Tal, Tien, David, Huang, Eros, Kuo, Kelly T. L., Amir, Nuriel

Année:

2014

Langue:

english

Fichier:

PDF, 634 KB

english, 2014

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing

Capodieci, Luigi, Cain, Jason P., Wang, Lynn T. - N., Schroeder, Uwe Paul, Madhavan, Sriram

Année:

2017

Langue:

english

Fichier:

PDF, 1.04 MB

english, 2017

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - A random generation approach to pattern library creation for full chip lithographic simulation

Capodieci, Luigi, Cain, Jason P., Zou, Elain, Hong, Sid, Liu, Limei, Huang, Lucas, Yang, Legender, Kabeel, Aliaa, Madkour, Kareem, ElManhawy, Wael, Kwan, Joe, Du, Chunshan, Hu, Xinyi, Wan, Qijian, Zha

Année:

2017

Langue:

english

Fichier:

PDF, 932 KB

english, 2017

21

What you don’t know won’t hurt me: Costly (but quiet) exit in dictator games

Jason Dana, Daylian M. Cain, Robyn M. Dawes

Journal:

Organizational Behavior and Human Decision Processes

Année:

2006

Langue:

english

Fichier:

PDF, 179 KB

english, 2006

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Simulation of AIMS measurements using rigorous mask 3D modeling

Cain, Jason P., Sanchez, Martha I., Chou, Chih-Shiang, Huang, Hsu-Ting, Chu, Fu-Sheng, Chu, Yuan-Chih, Huang, Wen-Chun, Liu, Ru-Gun, Gau, Tsai-Sheng

Année:

2015

Langue:

english

Fichier:

PDF, 767 KB

english, 2015

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Cain, Jason P., Sanchez, Martha I., Bhattacharyya, Kaustuve, den Boef, Arie, Jak, Martin, Zhang, Gary, Maassen, Martijn, Tijssen, Robin, Adam, Omer, Fuchs, Andreas, Zhang, Youping, Huang, Jacky, Coura

Année:

2015

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2015

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Overlay improvement by exposure map based mask registration optimization

Cain, Jason P., Sanchez, Martha I., Shi, Irene, Guo, Eric, Chen, Ming, Lu, Max, Li, Gordon, Li, Rivan, Tian, Eric

Année:

2015

Langue:

english

Fichier:

PDF, 3.97 MB

english, 2015

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Lithography overlay control improvement using patterned wafer geometry for sub-22nm technology nodes

Cain, Jason P., Sanchez, Martha I., Peterson, Joel, Rusk, Gary, Veeraraghavan, Sathish, Huang, Kevin, Koffas, Telly, Kimani, Peter, Sinha, Jaydeep

Année:

2015

Langue:

english

Fichier:

PDF, 778 KB

english, 2015

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - HVM capabilities of CPE run-to-run overlay control

Cain, Jason P., Sanchez, Martha I., Subramany, Lokesh, Chung, Woong Jae, Gutjahr, Karsten, Garcia-Medina, Miguel, Sparka, Christian, Yap, Lipkong, Demirer, Onur, Karur-Shanmugam, Ramkumar, Riggs, Bren

Année:

2015

Langue:

english

Fichier:

PDF, 877 KB

english, 2015

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography

Cain, Jason P., Sanchez, Martha I., Okai, Nobuhiro, Lavigne, Erin, Hitomi, Keiichiro, Halle, Scott, Hotta, Shoji, Koshihara, Shunsuke, Tanaka, Junichi, Bailey, Todd

Année:

2015

Langue:

english

Fichier:

PDF, 726 KB

english, 2015

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Cain, Jason P., Sanchez, Martha I., Chen, Kai-Hsiung, Huang, GT, Chen, KS, Hsieh, C. W., Chen, YC, Ke, CM, Gau, TS, Ku, YC, Bhattacharyya, Kaustuve, Huang, Jacky, den Boef, Arie, v. d. Schaar, Maurits

Année:

2014

Langue:

english

Fichier:

PDF, 3.27 MB

english, 2014

29

Post-Curing Effects on Marine VARTM FRP Composite Material Properties for Test and Implementation

Cain, Jason J., Post, Nathan L., Lesko, John J., Case, Scott W., Lin, Yin-Nian, Riffle, Judy S., Hess, Paul E.

Journal:

Journal of Engineering Materials and Technology

Année:

2006

Langue:

english

Fichier:

PDF, 663 KB

english, 2006

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Multiple height calibration reference for nano-metrology

Cain, Jason P., Sanchez, Martha I., Christophersen, M., Phlips, B. F., Boudreau, A. J., Yetzbacher, M. K.

Année:

2015

Langue:

english

Fichier:

PDF, 682 KB

english, 2015

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Qmerit-calibrated overlay to improve overlay accuracy and device performance

Cain, Jason P., Sanchez, Martha I., Ullah, Md Zakir, Jazim, Mohamed Fazly Mohamed, Sim, Stella, Lim, Alan, Hiem, Biow, Chuen, Lieu Chia, Ang, Jesline, Lim, Ek Chow, Klein, Dana, Amit, Eran, Volkovitch

Année:

2015

Langue:

english

Fichier:

PDF, 749 KB

english, 2015

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - High-speed AFM for 1x node metrology and inspection: Does it damage the features?

Cain, Jason P., Sanchez, Martha I., Sadeghian, Hamed, van den Dool, Teun C., Uziel, Yoram, Bar Or, Ron

Année:

2015

Langue:

english

Fichier:

PDF, 932 KB

english, 2015

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Cain, Jason P., Sanchez, Martha I., Lee, Hong-Goo, Schmitt-Weaver, Emil, Kim, Min-Suk, Han, Sang-Jun, Kim, Myoung-Soo, Kwon, Won-Taik, Park, Sung-Ki, Ryan, Kevin, Theeuwes, Thomas, Sun, Kyu-Tae, Lim,

Année:

2015

Langue:

english

Fichier:

PDF, 5.84 MB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Reduction of image-based ADI-to-AEI overlay inconsistency with improved algorithm

Chen, Yen-Liang, Lin, Shu-Hong, Chen, Kai-Hsiung, Ke, Chih-Ming, Gau, Tsai-Sheng, Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 1.03 MB

english, 2013

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Overlay accuracy calibration

Amit, Eran, Klein, Dana, Cohen, Guy, Amir, Nuriel, Har-Zvi, Michael, Kato, Cindy, Kurita, Hiroyuki, Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 1021 KB

english, 2013

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Integrated ADI optical metrology solution for lithography process control of CD and OV

Cain, Jason P., Sanchez, Martha I., Strobl, Marlene, Tsai, Wilhelm, Lan, Andy, Chen, Tom, Hsu, Wilson, Chen, Henry, Liang, Frida, Wang, Alan, Hung, Platt, Huang, David, Chiu, Ethan, Yu, Paul, Song, Yi

Année:

2014

Langue:

english

Fichier:

PDF, 2.48 MB

english, 2014

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

Capodieci, Luigi, Cain, Jason P., Wang, Lynn T., Schroeder, Uwe Paul, Woo, Youngtag, Zeng, Jia, Madhavan, Sriram, Capodieci, Luigi

Année:

2016

Langue:

english

Fichier:

PDF, 1.07 MB

english, 2016

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Mask contribution to intra-field wafer overlay

Cain, Jason P., Sanchez, Martha I., Chou, William, Chang, Hsien-Min, Chen, Chao Yin, Wagner, M., Roeth, K.-D., Czerkas, S., Ferber, M., Daneshpanah, M., Laske, F., Chiang, R., Klein, S.

Année:

2014

Langue:

english

Fichier:

PDF, 4.63 MB

english, 2014

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Imbalance aware lithography hotspot detection: a deep learning approach

Capodieci, Luigi, Cain, Jason P., Yang, Haoyu, Luo, Luyang, Su, Jing, Lin, Chenxi, Yu, Bei

Année:

2017

Langue:

english

Fichier:

PDF, 593 KB

english, 2017

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Using pattern matching to increase performance in hotspot fixing flows

Capodieci, Luigi, Cain, Jason P., Falch, Bradley J., Baek, Seung-Hee, Tsai, John, Ji, Mingchao, Zhu, Jun

Année:

2017

Langue:

english

Fichier:

PDF, 390 KB

english, 2017

41

A Meta-Analysis of Resistance Training in Female Youth: Its Effect on Muscular Strength, and Shortcomings in the Literature

Moran, Jason, Sandercock, Gavin, Ramirez-Campillo, Rodrigo, Clark, Cain C. T., Fernandes, John F. T., Drury, Benjamin

Journal:

Sports Medicine

Année:

2018

Langue:

english

Fichier:

PDF, 678 KB

english, 2018

42

A Meta-Analysis of Plyometric Training in Female Youth

Moran, Jason, Clark, Cain C.T., Ramirez-Campillo, Rodrigo, Davies, Michael J., Drury, Benjamin

Journal:

The Journal of Strength and Conditioning Research

Année:

2018

Langue:

english

Fichier:

PDF, 371 KB

english, 2018

43

Eccentric Resistance Training in Youth: Perspectives for Long-Term Athletic Development

Drury, Benjamin, Ratel, Sébastien, Clark, Cain C.T., Fernandes, John F.T., Moran, Jason, Behm, David G

Journal:

Journal of Functional Morphology and Kinesiology

Année:

2019

Fichier:

PDF, 983 KB

2019

44

Giving Versus Giving In

Cain, Daylian M., Dana, Jason, Newman, George E.

Journal:

The Academy of Management Annals

Année:

2014

Langue:

english

Fichier:

PDF, 243 KB

english, 2014

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Further advancing the throughput of a multi-beam SEM

Cain, Jason P., Sanchez, Martha I., Kemen, Thomas, Malloy, Matt, Thiel, Brad, Mikula, Shawn, Denk, Winfried, Dellemann, Gregor, Zeidler, Dirk

Année:

2015

Langue:

english

Fichier:

PDF, 1.23 MB

english, 2015

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Scatterometry-based metrology for the 14nm node double patterning lithography

Cain, Jason P., Sanchez, Martha I., Carau, D., Bouyssou, R., Ducoté, J., Dettoni, F., Ostrovsky, A., Le Gratiet, B., Dezauzier, C., Besacier, M., Gourgon, C.

Année:

2015

Langue:

english

Fichier:

PDF, 1.27 MB

english, 2015

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Comprehensive BEOL control using scatterometry and APC

Cain, Jason P., Sanchez, Martha I., Timoney, Padraig, Tsai, Jamie, Baral, Sudhir, Economikos, Laertis, Vaid, Alok, Lu, Haibo, Kang, Byungcheol, Isbester, Paul, Dasari, Prasad, Kort, Roy, Yellai, Naren

Année:

2015

Langue:

english

Fichier:

PDF, 561 KB

english, 2015

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - More systematic errors in the measurement of power spectral density

Cain, Jason P., Sanchez, Martha I., Mack, Chris A.

Année:

2015

Langue:

english

Fichier:

PDF, 1.82 MB

english, 2015

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Mueller based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties

Muthinti, Gangadhara R., Medikonda, Manasa, Fronheiser, Jody, Kamineni, Vimal K., Peterson, Brennan, Race, Joseph, Diebold, Alain C., Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 1.65 MB

english, 2013

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Photoluminescence metrology for LED characterization in high volume manufacturing

Raymond, Christopher J., Li, Zhiqiang, Starikov, Alexander, Cain, Jason P.

Année:

2013

Langue:

english

Fichier:

PDF, 751 KB

english, 2013